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Title:
PLASMA PROCESS APPARATUS UTILIZING CHEMICAL REACTION
Document Type and Number:
Japanese Patent JPS6078636
Kind Code:
A
Abstract:

PURPOSE: To uniformize the distribution of reaction gas on the surface of each specimen by performing evacuation through a central exhaust duct, by providing a central exhaust duct having exhaust ports provided thereto at a position symmetric to a specimen.

CONSTITUTION: A central exhaust duct, wherein a pair of specimen holders 10 capable of determining the positions of specimens 9 at positions opposed to a pair of opposedly arranged electrodes are provided between said electrodes are exhaust ports 5b, 5c are mounted at positions symmetric to the specimens 9 held to the speciment holders 10, is arranged between a pair of the specimen holders 10. By evacuation through this duct 5, reaction gas introduced against the surfaces of the specimens 9 can be exhausted to a symmetric direction without being exhausted to one direction as is conventional and, as a result, the distribution of the reaction gas at the surface of each specimen can be enhanced and the uniformization of distribution can be easily achieved.


Inventors:
MINAMI JIROU
Application Number:
JP18448483A
Publication Date:
May 04, 1985
Filing Date:
October 04, 1983
Export Citation:
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Assignee:
ULVAC CORP
International Classes:
H01J37/32; B01J19/08; C23C16/50; (IPC1-7): B01J19/08
Domestic Patent References:
JPS5651828A1981-05-09
JPS56152736A1981-11-26
Attorney, Agent or Firm:
Shigeru Yagita