Title:
プラズマ処理装置、監視方法および監視プログラム
Document Type and Number:
Japanese Patent JP7280113
Kind Code:
B2
Abstract:
A plasma processing apparatus includes a storage unit, an acquisition unit and a monitoring unit. The storage unit stores change information indicating a change in a value for a temperature of a mounting table when a processing condition of plasma processing for a target object mounted on the mounting table is changed. The acquisition unit acquires the value for the temperature of the mounting table in a predetermined cycle. The monitoring unit monitors, based on the change information, a change in the processing condition of the plasma processing from the change in the value for the temperature of the mounting table acquired by the acquisition unit.
Inventors:
Shinsuke Oka
Application Number:
JP2019100392A
Publication Date:
May 23, 2023
Filing Date:
May 29, 2019
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/46; H01L21/3065
Domestic Patent References:
| JP2017005128A | ||||
| JP2010171288A | ||||
| JP2008177285A | ||||
| JP2009111301A |
Foreign References:
| US6468384 |
Attorney, Agent or Firm:
Sakai International Patent Office