Title:
PLASMA PROCESSING APPARATUS WITH MAGNIFIED MAGNETIC FIELD
Document Type and Number:
Japanese Patent JPS62195122
Kind Code:
A
Abstract:
A flat book-shaped substrate support electrode (24) for a magnetically enhanced plasma processing apparatus has primary magnetic poles at first and second ends for generating a primary magnetic field (38) that extends between the ends of the electrode in front of a processing surface of the electrode. An auxiliary magnet structure (39) is spaced from the processing surface for generating an auxiliary magnetic field that tends to flatten the primary magnetic field. A diverter magnet (48) generates a third magnetic field having curved lines of force centered on an axis spaced from a first edge of the electrode toward which electron drift occurs. The third magnetic field interacts with the resultant of the primary field and the auxiliary field at the first edge of the electrode and acts to stabilize the plasma in this region.
Inventors:
KEBIN PII ODONERU
Application Number:
JP25712586A
Publication Date:
August 27, 1987
Filing Date:
October 30, 1986
Export Citation:
Assignee:
MATERIALS RESEARCH CORP
International Classes:
H01L21/205; H01J37/32; H01L21/302; H01L21/3065; H01L21/31; (IPC1-7): H01L21/205; H01L21/302; H01L21/31
Domestic Patent References:
| JPS6077428A | 1985-05-02 | |||
| JPS596543A | 1984-01-13 |
Attorney, Agent or Firm:
Aoki Akira