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Patent Searching and Data


Title:
PLASMA PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2014157760
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a novel plasma processing apparatus and plasma processing method, capable of making a surface of a stereoscopic structure in a complicated geometry expose to plasma with high efficiency and uniformly.SOLUTION: The plasma processing apparatus includes: a processing container 12 including a plasma generating section; a control section 14; and a drive section 16. The processing section 12 includes a plasma generation section 11 for generating plasma therein. The control section 14 includes a power circuit for supplying electric power required to generate plasma in the processing container 12. The drive section 16 includes a power transmission section that generates power and transmits power from the outside of the processing container 12 to the processing container 12.

Inventors:
TAGUCHI KOJI
YAMAZAKI MITSUO
TSUCHIDA TOMOHITO
Application Number:
JP2013028782A
Publication Date:
August 28, 2014
Filing Date:
February 18, 2013
Export Citation:
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Assignee:
SAKIGAKE HANDOTAI KK
International Classes:
H05H1/46; B01J19/08
Attorney, Agent or Firm:
Masashi Moriwaki
Tetsuro Kawahara