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Patent Searching and Data


Title:
PLASMA PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP2020035753
Kind Code:
A
Abstract:
To provide a vacuum processing device in which processing efficiency is improved by improving maintenance work efficiency.SOLUTION: A plasma processing device comprises a vacuum container having a processing chamber in which a wafer is processed using plasma, and is configured so as to be removable when at least one member composing the vacuum container is moved horizontally with respect to a base plate. The plasma processing device has a lifter that is arranged at a side of the vacuum container with the vacuum container of the base plate between them, and connected to and mounted on an end part opposite a vacuum conveyance chamber in which the wafer is conveyed and that vertically moves the removable member having a vertical shaft. The plasma processing device comprises: a connection part by which the lifter is connected to the vertical shaft and to the removable member and moves along the vertical shaft; and a pivotal shaft which is a joint part arranged on this connection part and having a vertical rotation shaft, around which the removable member pivots horizontally.SELECTED DRAWING: Figure 2

Inventors:
UEMURA TAKASHI
TAUCHI TSUTOMU
SATO KOHEI
Application Number:
JP2019194884A
Publication Date:
March 05, 2020
Filing Date:
October 28, 2019
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP
International Classes:
H05H1/46; C23C16/54; H01L21/3065
Attorney, Agent or Firm:
Shigemi Iwasaki