Title:
プラズマ処理装置
Document Type and Number:
Japanese Patent JP6847452
Kind Code:
B2
Abstract:
To provide a plasma processing apparatus which performs processing of an object by plasma produced from a liquid and which dispenses with a drying step of removing the liquid from the processed object.SOLUTION: A plasma processing apparatus 10 includes: a container 14 for retaining a liquid 81 that is a plasma material; a slot antenna 15 for transmitting a microwave into a processing space S1 that does not sink into the liquid 81 within the container 14; and a holder 16 that has at least a first part arranged in the processing space S1 and that has a second part brought into contact with the liquid 81 while holding a back surface of an object 80 by the first part.SELECTED DRAWING: Figure 1
Inventors:
Tatsuo Ishijima
Takuya Ito
Takuya Kitano
Takuya Ito
Takuya Kitano
Application Number:
JP2017104137A
Publication Date:
March 24, 2021
Filing Date:
May 26, 2017
Export Citation:
Assignee:
Kanazawa University
International Classes:
H01L21/3065; B01J19/08; H05H1/24; H05H1/46
Domestic Patent References:
| JP2014127705A | ||||
| JP2006107002A1 |
Attorney, Agent or Firm:
Hiromori Arai