Title:
PLASMA PROCESSING SYSTEM, MEMBER FOR GENERATING AND INTRODUCING PLASMA, AND SLOT ELECTRODE
Document Type and Number:
Japanese Patent JP3477573
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a plasma processing system performing high quality plasma processing by preventing mixture of impurities while ensuring the plasma processing rate of an article to be processed, a member for introducing plasma and a slot electrode.
SOLUTION: A slot electrode is provided with a slit for guiding a wave of power source frequency required for plasma processing to a chamber for plasma processing an article to be processed. The slot electrode is divided into a plurality of regions having a uniform area, and the slit is arranged in each region. The slot electrode has a substantially constant slit density, because it is divided into a plurality of regions having a uniform area and the slit is arranged in each region.
Inventors:
Toshiaki Hongo
Akira Ohsawa
Akira Ohsawa
Application Number:
JP2000085332A
Publication Date:
December 10, 2003
Filing Date:
March 24, 2000
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/46; B01J19/08; C23C16/511; H01L21/302; H01L21/3065; H01L21/31; (IPC1-7): H01L21/31; B01J19/08; C23C16/511; H01L21/3065; H05H1/46
Domestic Patent References:
| JP9181052A | ||||
| JP200058294A | ||||
| JP5129095A | ||||
| JP200077335A | ||||
| JP4117437U |
Attorney, Agent or Firm:
Ryosuke Fujimoto
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