Title:
PLASMA PROCESSOR
Document Type and Number:
Japanese Patent JP3645768
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a plasma processor at low cost that can process a large substrate with uniform plasma.
SOLUTION: A plasma processor comprises a dielectric plate 5 for radiating plasma to a chamber inside 12 and dielectric plate support members 6A to 6D for supporting the dielectric plate 5. The dielectric plate support plates 6A to 6C comprise a plurality of gas inlets 6a for supplying reactive gas to the chamber inside 12. The outlets of the gas injecting holes 6a are formed on a surface facing a surface of a substrate 8 and are disposed on an outer region of the dielectric plate 5. Further, a ground potential is applied to a chamber lid 1 and the dielectric support members 6A to 6D, and a bias potential is applied to the substrate 8.
Inventors:
Naoko Yamamoto
Takamitsu Tadera
Tatsushi Yamamoto
Masaki Hirayama
Tadahiro Ohmi
Takamitsu Tadera
Tatsushi Yamamoto
Masaki Hirayama
Tadahiro Ohmi
Application Number:
JP34755099A
Publication Date:
May 11, 2005
Filing Date:
December 07, 1999
Export Citation:
Assignee:
Sharp Corporation
Tadahiro Ohmi
Tadahiro Ohmi
International Classes:
C23C16/511; C23F4/00; H01J37/32; H01L21/302; H01L21/20; H01L21/3065; H01L21/31; (IPC1-7): H01L21/3065; C23C16/511; C23F4/00; H01L21/31
Domestic Patent References:
| JP11297672A | ||||
| JP8003770A | ||||
| JP10340891A | ||||
| JP8250577A | ||||
| JP11297672A | ||||
| JP2000012291A |
Attorney, Agent or Firm:
Kuro Fukami
Previous Patent: DC POWER SUPPLY DEVICE AND SYSTEM
Next Patent: REFLECTIVE LIQUID CRYSTAL DISPLAY DEVICE
Next Patent: REFLECTIVE LIQUID CRYSTAL DISPLAY DEVICE