Title:
PLASMA RESISTANT MEMBER
Document Type and Number:
Japanese Patent JP2016008352
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a plasma resistant member capable of reducing particles and stably maintaining a chamber condition.SOLUTION: The plasma resistant member comprises: a base material; and a layer structure including a yttria polycrystal formed on the surface of the base material by an aerosol deposition method and having plasma resistance. The crystal structure of the yttria polycrystal constituting the layer structure has cubic and monoclinic crystals mixed together. The monoclinic ratio to the cubic crystal is 60% or less. The crystallite size of the yttria polycrystalline substance constituting the layer structure is 50 nm or less.
Inventors:
IWAZAWA JUNICHI
Application Number:
JP2014131779A
Publication Date:
January 18, 2016
Filing Date:
June 26, 2014
Export Citation:
Assignee:
TOTO LTD
International Classes:
C23C24/04; C04B41/87; H01L21/205; H01L21/3065; H05H1/46
Domestic Patent References:
| JP2012136782A | 2012-07-19 | |||
| JP5578383B2 | 2014-08-27 | |||
| JP2007131943A | 2007-05-31 | |||
| JP2012191200A | 2012-10-04 |
Foreign References:
| WO2013099890A1 | 2013-07-04 |
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