Title:
プラズマ源及びプラズマ処理装置
Document Type and Number:
Japanese Patent JP7403052
Kind Code:
B2
Abstract:
To shorten a distance from an antenna to the inside of a vacuum vessel by using a slit plate, and flexibly and easily change the slit width.SOLUTION: A plasma source that generates plasma inside a vacuum vessel by passing a high-frequency current through an antenna 2 provided outside the vacuum vessel includes a first slit plate 71 that closes an opening formed at a position facing the antenna 2 of the vacuum vessel, a dielectric plate 8 that closes a formed first slit 71x from the outside of the vacuum vessel, and a second slit plate 72 that is provided at a position between the first slit plate 71 and the dielectric plate 8 or at a position where the dielectric plate 8 is sandwiched between the first slit plate 71 and the second slit plate, and in which a second slit 72x a part of which overlaps with the first slit 71x is formed, and a high-frequency magnetic field generated from the antenna 2 is transmitted into the vacuum vessel through an actual slit 7x in which the first slit 71x and the second slit 72 overlap each other.SELECTED DRAWING: Figure 3
Inventors:
Kazuhiko Irisawa
Yasunori Ando
Yasunori Ando
Application Number:
JP2020011185A
Publication Date:
December 22, 2023
Filing Date:
January 27, 2020
Export Citation:
Assignee:
Nissin Electric Co., Ltd.
International Classes:
H05H1/46; C23C16/505; H01L21/3065; H01L21/31
Domestic Patent References:
| JP2016143616A | ||||
| JP2013191593A | ||||
| JP2014154684A | ||||
| JP11111495A |
Attorney, Agent or Firm:
Ryuhei Nishimura
Shindai Saito
Yoshinaga Uemura
Atsushi Nakamura
Haruko Maeda
Shindai Saito
Yoshinaga Uemura
Atsushi Nakamura
Haruko Maeda