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Title:
PLASMA SPECTROSCOPIC ANALYSIS APPARATUS
Document Type and Number:
Japanese Patent JP2013185918
Kind Code:
A
Abstract:

To improve detection sensitivity, detection accuracy, and reproducibility when electrical discharge is generated in a sample solution and analysis is performed by light emission in plasma.

In a plasma spectroscopic analysis apparatus, a flow channel 100 that conically spreads from a narrow part and has a cylindrical principal part is filled with a conductive sample solution. Plasma is made to generate in bubbles produced by applying an electric field to the flow channel 100 and light emission is measured. The flow channel is filled with a conductive liquid and an electric field is applied to the flow channel to produce bubbles to generate plasma therein. The flow channel is installed so as to be virtually in parallel to a vertical line. A region adjacent to the narrow part of the flow channel is an object for measuring.


Inventors:
OBARA MASANOBU
TAKAMURA ZEN
Application Number:
JP2012050497A
Publication Date:
September 19, 2013
Filing Date:
March 07, 2012
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP
International Classes:
G01N21/67; G01N21/71
Domestic Patent References:
JP2011180045A2011-09-15
JP2010197358A2010-09-09
JPH10300671A1998-11-13
JPH04366749A1992-12-18
JP3932368B22007-06-20
Attorney, Agent or Firm:
Yusuke Hiraki
Sekiya Mitsuo
Toshiaki Watanabe