Title:
PLASMA SURFACE PROCESSOR AND PLASMA SURFACE PROCESSING METHOD
Document Type and Number:
Japanese Patent JP3575011
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a surface processor and a surface processing method for executing uniform plasma surface processing even to a 1mx1m class large area substrate by uniformly generating a plasma in a VHF band(30 to 300MHz) between a pair of electrodes in a vacuum container with satisfactory reproducibility.
SOLUTION: This surface processor and method for processing the surface of a substrate 13 arranged at one of a pair of electrodes 2 and 4 in a vacuum container 1 by using a plasma inserts a balancing/unbalancing converter 19 between the pair of electrodes 2 and 4 and a coaxial cable 16c, inserts a standing wave detector 61 between a matching unit 17 and the pair of electrodes 2 and 4, and adds a reactance adjusting device 71 in parallel with the pair of electrodes 2 and 4.
Inventors:
Murata, Masayoshi
Application Number:
JP2003000191752
Publication Date:
July 16, 2004
Filing Date:
July 04, 2003
Export Citation:
Assignee:
Murata, Masayoshi
International Classes:
H05H1/46; B01J3/00; B01J19/08; C23C16/509; H01L21/205; (IPC1-7): H01L21/205; B01J3/00; B01J19/08; H05H1/46
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