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Title:
PLASMA SYSTEM WITH INJECTION DEVICE
Document Type and Number:
Japanese Patent JP2011094225
Kind Code:
A
Abstract:

To provide a plasma system with an injection device capable of sufficiently mixing plasma with a reactant so as not to deposit the reactant on electrodes.

The plasma system includes a plasma cavity and an injection device 200. The plasma cavity includes a first electrode and a second electrode in order to generate the plasma. The injection device includes a plasma injection tube 210 and at least one reactant injection tube 220. The plasma injection tube is connected to the plasma cavity. The plasma injection tube includes an injection port H1, a discharge port H2 and an outer side wall S2. The plasma injection tube takes in the plasma from the injection port and outputs the plasma from the discharge port. The outer side wall has a cross-sectional width gradually decreasing toward the discharge port from the injection port. The reactant injection tube is arranged on the outside of the outer side wall. The reactant injection tube injects the reactant to the outer side wall, so that the reactant flows along the outer wall toward the discharge port and is mixed with the plasma at the discharge port.


Inventors:
LIU CHI-HUNG
TSAI CHEN-DER
HSU WEN-TUNG
SU CHUN-HSIEN
CHEN WEN-CHIN
CHEN LIANG-YI
Application Number:
JP2010014729A
Publication Date:
May 12, 2011
Filing Date:
January 26, 2010
Export Citation:
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Assignee:
IND TECH RES INST
International Classes:
C23C16/513; H05H1/24
Domestic Patent References:
JPH11293443A1999-10-26
JP2000178744A2000-06-27
Attorney, Agent or Firm:
Mitsue Obuchi
Yukio Fuse