Title:
PLASMA TREATMENT APPARATUS AND METHOD FOR CLEANING THE SAME
Document Type and Number:
Japanese Patent JP2003197615
Kind Code:
A
Abstract:
To provide a plasma treatment apparatus which can be efficiently cleaned and to provide a method for cleaning the same.
The plasma treatment apparatus comprises an exhaust duct 37 connected directly to a diffusing unit 29a for diffusing process gas produced in an upper electrode 26 functioning as a showering head. The apparatus further comprises a cleaning exhaust line L4 having the duct 37 as its one end and connected to an exhaust port 36 and connected to an exhaust line L3 for exhausting the chamber 11. Cleaning gas supplied from a cleaning gas line L2 is exhausted from the chamber 11 through an interior of the upper electrode 26.
Inventors:
FUJISATO TOSHIAKI
Application Number:
JP2001394282A
Publication Date:
July 11, 2003
Filing Date:
December 26, 2001
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
C23C16/44; C23C16/455; C23C16/509; H01J37/32; H01L21/302; H01L21/3065; H01L21/31; H01L21/461; (IPC1-7): H01L21/31; C23C16/44; H01L21/3065
Attorney, Agent or Firm:
Kimura Mitsuru