Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PLASMA TREATMENT APPARATUS
Document Type and Number:
Japanese Patent JP2002093789
Kind Code:
A
Abstract:

To provide a plasma treatment system, which prevents the inner surface of a treating chamber from being deteriorated due to a plasma and prevents the inner surface of the treating chamber from being turned into a heavy metal contamination source and also stabilizes the characteristics of a plasma treatment with age.

A plasma treatment apparatus consists of a plasma generator, a treating chamber 4 capable of being decompressed, a treatment gas feeding unit 13 for feeding gas to the chamber 4, a sample stand 10 for holding a sample 11 and a vacuum exhaust system 9. In this plasma treatment apparatus, the chamber 4 is provided with an outer cylinder 5 capable of withstanding a decompression and an inner cylinder 6 arranged on the inside of the cylinder 5 via a gap 14 and a heater 21 and a temperature control means 22 are provided on the cylinder 5. An inner cylinder consisting of a non-magnetic metallic material not containing heavy metals or a ceramic, carbon, silicon or quartz material is used as the cylinder 6. The cylinder 5 is heated by the heater 21 and the means 22 to control the temperature of the cylinder 6 at the desired value.


Inventors:
KANAI SABURO
TAKAHASHI NUSHITO
OKAMURA KOICHI
HAMAZAKI RYOJI
ITO SATORU
Application Number:
JP2001159117A
Publication Date:
March 29, 2002
Filing Date:
March 16, 1995
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HITACHI LTD
International Classes:
H05H1/46; B01J19/08; C23C16/44; H01L21/302; H01L21/3065; (IPC1-7): H01L21/3065; B01J19/08; H05H1/46
Attorney, Agent or Firm:
Katsuo Ogawa (1 person outside)