Title:
PLASMA-TREATMENT APPARATUS
Document Type and Number:
Japanese Patent JP2009285529
Kind Code:
A
Abstract:
To provide a plasma-treatment apparatus that has a simple structure, effectively cools its electrodes, and can remarkably extend the life of the electrodes.
The plasma treatment apparatus that generates plasma between an upper electrode 1 and a lower electrode 2 to treat an object to be treated comprises a liquid supply mechanism 6 that supplies a liquid in a manner causing the liquid to penetrate the upper electrode 1.
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Inventors:
AWAJI TOSHIO
NAKAYAMA TAKASHI
NAKAYAMA TAKASHI
Application Number:
JP2008137920A
Publication Date:
December 10, 2009
Filing Date:
May 27, 2008
Export Citation:
Assignee:
CLEAN TECHNOLOGY CO LTD
International Classes:
B01D53/70; B01J19/08; H05H1/24
Domestic Patent References:
JP2001259409A | 2001-09-25 | |||
JP2007021290A | 2007-02-01 | |||
JP2004209373A | 2004-07-29 | |||
JP2005168533A | 2005-06-30 | |||
JP2003017297A | 2003-01-17 |
Attorney, Agent or Firm:
Osamu Mori