Title:
PLASMA TREATMENT APPARATUS
Document Type and Number:
Japanese Patent JP3534716
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a plasma treatment system, which prevents the inner surface of a treating chamber from being deteriorated due to a plasma and prevents the inner surface of the treating chamber from being turned into a heavy metal contamination source and also stabilizes the characteristics of a plasma treatment with age.
SOLUTION: A plasma treatment apparatus consists of a plasma generator, a treating chamber 4 capable of being decompressed, a treatment gas feeding unit 13 for feeding gas to the chamber 4, a sample stand 10 for holding a sample 11 and a vacuum exhaust system 9. In this plasma treatment apparatus, the chamber 4 is provided with an outer cylinder 5 capable of withstanding a decompression and an inner cylinder 6 arranged on the inside of the cylinder 5 via a gap 14 and a heater 21 and a temperature control means 22 are provided on the cylinder 5. An inner cylinder consisting of a non-magnetic metallic material not containing heavy metals or a ceramic, carbon, silicon or quartz material is used as the cylinder 6. The cylinder 5 is heated by the heater 21 and the means 22 to control the temperature of the cylinder 6 at the desired value.
Inventors:
Kanai, Saburo
Takahashi, Nushito
Okamura, Koichi
Hamazaki, Ryoji
Ito, Satoru
Takahashi, Nushito
Okamura, Koichi
Hamazaki, Ryoji
Ito, Satoru
Application Number:
JP2001159117A
Publication Date:
June 07, 2004
Filing Date:
March 16, 1995
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H05H1/46; B01J19/08; C23C16/44; H01L21/302; H01L21/3065; (IPC1-7): H01L21/3065; B01J19/08; H05H1/46
Attorney, Agent or Firm:
小川 勝男 （外１名）
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