Title:
Plasma treatment apparatus
Document Type and Number:
Japanese Patent JP6138581
Kind Code:
B2
Abstract:
A resonance frequency is adjusted or optimized by shifting the resonance frequency without reducing an impedance function or a withstand voltage characteristic against a high frequency noise, when blocking, by using a multiple parallel resonance characteristic of a distributed constant line, the high frequency noise introduced into a line such as a power feed line or a signal line from an electrical member other than a high frequency electrode within a processing vessel. Regarding winding pitches, each of the solenoid coils 104(1) and 104(2) is divided to multiple sections K1, K2, . . . in a coil axis direction, and, a winding pitch pi in each section Ki (i=1, 2, . . . ) is set independently. Comb teeth M inserted into winding gaps of both solenoid coils 104(1) and 104(2) are formed on inner surfaces of multiple rod-shaped comb-teeth member 114 provided adjacent to the solenoid coils 104(1) and 104(2).
Inventors:
Naohiko Okunishi
Application Number:
JP2013106895A
Publication Date:
May 31, 2017
Filing Date:
May 21, 2013
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/46; H01L21/205; H01L21/3065; H01P1/20; H03H7/01
Domestic Patent References:
| JP2008198902A | ||||
| JP7106138A | ||||
| JP51057330U | ||||
| JP2011135052A |
Attorney, Agent or Firm:
Seishin ip patent business corporation
Filial piety Sasaki
Filial piety Sasaki
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