Title:
PLASMA TREATMENT APPARATUS
Document Type and Number:
Japanese Patent JPS5831532
Kind Code:
A
Abstract:
PURPOSE:To eliminate the manual loading/unloading step of wafers into/from a wafer cassette thereby to improve efficiency and prevent wafers from being undesirable flow by a pincette, by a method wherein wafers are automatically transferred from a wafer cassette to a wafer holder, which is then automatically loaded into a reaction tube for treatment, and then the wafers are transferred from the holder back into the cassette. CONSTITUTION:While being contained in a wafer cassette 19, wafers 1 are set on an elevator 20 and transferred from the cassette 19 to a wafer holder 11, one by one, by means of conveyors 24, 25. Every time one wafer has been transferred, the holder 11 is lifted up one pitch. When all the wafers 1 have been transferred to the holder 11 and loaded into a reaction tube 4 and the pressure in the reaction tube 4 reaches about 10 Pascals, a gas valve 9 is opened, and a reactive gas (e.g., O2, CF4 or the like) is introduced into the reaction tube 4 through a gas inlet pipe 5. After a treatment for a predetermined period of time, the treated wafers are transferred back into the cassette 19 in the procedure reverse to the supply of the wafers.
Inventors:
HORI YASUHIKO
Application Number:
JP12904281A
Publication Date:
February 24, 1983
Filing Date:
August 18, 1981
Export Citation:
Assignee:
NIPPON ELECTRIC CO
International Classes:
H01L21/30; H01J37/34; H01L21/027; H01L21/302; H01L21/3065; (IPC1-7): H01L21/30
Attorney, Agent or Firm:
Uchihara Shin