Title:
PLASMA TREATMENT DEVICE
Document Type and Number:
Japanese Patent JP2001237223
Kind Code:
A
Abstract:
To provide a plasma treatment device which can uniformize the plasma density distribution in a vacuum vessel.
This plasma treatment device is constituted to treat an object 8 to be treated, by utilizing a plasma which is generated by emitting a microwave introduced into the vacuum vessel 4 through a microwave transmitting window member 3 against a process gas in the vessel 4. This device is provided with a coaxial line 1 through which the microwave generated from a microwave power source is propagated toward the vessel 4, and a microstrip line 2 in which the microwave propagated through the line 1 is transformed. The microstrip line 2 is extended along the air-side surface of the member 3.
Inventors:
YAMAZAKI TOMOO
Application Number:
JP2000044466A
Publication Date:
August 31, 2001
Filing Date:
February 22, 2000
Export Citation:
Assignee:
SHIBAURA MECHATRONICS CORP
International Classes:
H01L21/302; H01L21/3065; H05H1/46; (IPC1-7): H01L21/3065; H05H1/46
Attorney, Agent or Firm:
Kazuo Sato (3 others)
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