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Title:
PLATING BATH, METHOD OF PRODUCING PLATING COATING, AND METHOD OF PRODUCING RARE EARTH MAGNET
Document Type and Number:
Japanese Patent JP3868380
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a plating bath with which a rare earth magnet having excellent magnetic properties, adhesion properties and corrosion resistance can efficiently be produced by jointly using electroplating and electroless plating, to provide a method of producing a plating coating, and to provide a method of producing a rare earth magnet.
SOLUTION: A substrate 20 (magnet base body) is subjected to electrolytic treatment with a plating bath 10 in the jointly use of electroplating and electroless plating having a pH within the range in which a film deposition rate by electroless plating reaction is controlled to ≤0.3 μm/h, and also within the range of -2.0 from a value in which a film deposition rate by electroless plating reaction is controlled to 1.0 μm/h. In the vicinity of the surface of the substrate 20, the electroless plating reaction progresses in a recessed part 20A at which pH is locally increased, and only the electroplating reaction progresses in the region other than the recessed part 20A, so that a plating coating 30 (protective film) is formed so as to sufficiently cover the surface ruggedness of the substrate 20. Further, the ratio occupied by the electroless plating reaction is reduced in the whole of the plating reaction, so that the amount of hydrogen to be generated reduces.


Inventors:
Osamu Shinoura
Application Number:
JP2003045112A
Publication Date:
January 17, 2007
Filing Date:
February 21, 2003
Export Citation:
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Assignee:
tdk Corporation
International Classes:
C23C18/31; C25D7/00; H01F41/02; (IPC1-7): C23C18/31; C25D7/00; H01F41/02
Domestic Patent References:
JP61258868A
JP2001049448A
JP63195274A
JP9031606A
Attorney, Agent or Firm:
Yasushi Santanzaki
Yoichiro Fujishima