To develop a new technique for efficiently recovering a high purity target material in a simple and inexpensive method since a used spattering target containing platinum group elements for forming a thin film material is generated in large quantity accompanying the development of a semiconductor LSI (Large Scale Integration), a magnetic recording medium, a flat-panel type display, a cellular phone, etc.
The high purity waste platinum group element-containing target material is used as a starting material, and this material is chlorinated in fused salt and successively, the generated metallic chloride is selectively reduced to obtain the powder of high melting point metal and noble metal in a high purity state. The obtained metal powder is used for producing the spattering target material.
COPYRIGHT: (C)2010,JPO&INPIT
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Mizuno Akinori
Hideo Shimizu
Yuichi Takagi
Yoshinao Nakano
Hideki Akiba