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Patent Searching and Data


Title:
POLARIZATION INVERSION FORMING METHOD AND LIGHT WAVELENGTH CONVERTING ELEMENT
Document Type and Number:
Japanese Patent JP2002277915
Kind Code:
A
Abstract:

To form thick polarization inversion of a high aspect ratio by a method of forming a polarization inversion structure in a dielectric by electric field application.

This polarization inversion forming method has unipolarized ferroelectric crystal 1, and a process of forming a polarization inversion part 3 in a 1st area of ferroelectric crystal and a process of forming a polarization inversion part 5 in a 2nd area of the ferroelectric crystal and is characterized by that the polarization inversion parts formed in the 1st and 2nd areas overlap with each other at least partially. Consequently, the formed polarization inversion can be increased in thickness while having its cycle directional expansion suppressed and the thick polarization inversion structure of the high aspect ratio can be formed.


Inventors:
SUGITA TOMOYA
MIZUUCHI KIMINORI
YAMAMOTO KAZUHISA
Application Number:
JP2001082151A
Publication Date:
September 25, 2002
Filing Date:
March 22, 2001
Export Citation:
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Assignee:
MATSUSHITA ELECTRIC IND CO LTD
International Classes:
G02F1/377; (IPC1-7): G02F1/377
Attorney, Agent or Firm:
Fumio Iwahashi (2 others)