To prevent the occurrence of cracks in a polarized light separation film when the polarized light separation film to separate P-polarized light from S-polarized light is formed on a silicon oxide glass substrate.
The polarized light separation film is formed on the joining face of a substrate consisting of silicon oxide glass. The polarized light separation film is obtained by depositing a high refractive index material and a low refractive index material to form an optical multilayer film and then depositing a SiO2 layer as the last layer to ≥200 nm physical film thickness on the optical multilayer film or/and forming a SiO2 layer as the first layer to ≥200 nm physical film thickness in the substrate side under the optical multilayer film so as to prevent the occurrence of cracks.
UZAWA KUNIHIKO
TOYOHARA NOBUYOSHI
WADA YORIO
DEGUCHI TAKESHI
KAWAMATA TAKESHI
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