Title:
POLISH FINISHING METHOD AND ABRASIVE PAD FOR IRREGULAR SURFACE
Document Type and Number:
Japanese Patent JP07223167
Kind Code:
A
Abstract:
PURPOSE: To provide an efficient polishing method for smoothly finishing an irregular surface such as a floor surface made of stone and provide an abrasive pad shortening the work time and having a long life.
CONSTITUTION: A surface to be polished is rough-finished by a rough-finishing rotary abrasive pad having a flexible rim section 24 at the peripheral end of an abrasive body section 22, then the surface is finish-polished by a rotary finishing pad having an abrasive segment in a small area to suppress the suction phenomenon to the surface being polished.
Inventors:
Wiand, Ronald C.
Application Number:
JP1991000089506
Publication Date:
August 22, 1995
Filing Date:
March 28, 1991
Export Citation:
Assignee:
WIAND RONALD C
International Classes:
B24B7/18; B24B7/22; B24D7/06; B24D9/08; B24D13/14; (IPC1-7): B24D9/08; B24B7/18; B24B7/22; B24D7/06