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Title:
POLISHED OBJECT HOLDING MATERIAL, POLISHING APPARATUS, AND METHOD FOR POLISHING POLISHED OBJECT
Document Type and Number:
Japanese Patent JP2012139803
Kind Code:
A
Abstract:

To provide an economically advantageous polished object holding material shortened in a dressing time for the polished object holding material, suppressed in scratch to the polished object, and improved in warp precision in a thin substrate, substrate thickness precision, and lifetime.

The polished object holding material is formed by joining one layer of a liquid crystal polymer film to both sides including a base layer of a plate-like material 4 of one of a metal plate, a fiber-reinforced plastic plate, and a plastic plate via a thermosetting adhesive, or the polished is formed by stacking one layer of a liquid crystal polymer film on both sides of a glass long fiber base material 2 (prepreg) in which a plurality of thermosetting resins is impregnated.


Inventors:
OHORI KAZUHIKO
FUKUKAWA HIROSHI
Application Number:
JP2011000857A
Publication Date:
July 26, 2012
Filing Date:
January 05, 2011
Export Citation:
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Assignee:
KYOCERA CHEM CORP
International Classes:
B24B37/28; H01L21/304
Attorney, Agent or Firm:
Tamotsu Otani
Masamichi Tohei