Title:
POLISHING AGENT AND POLISHING METHOD
Document Type and Number:
Japanese Patent JP2014216368
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a polishing agent in polishing of a sapphire substrate, excellent in stability when using polishing for a long period of time by suppressing a variation of pH and improving sustainability of polishing speed, and to provide a polishing method.SOLUTION: The polishing agent for polishing a surface to be polished of a sapphire substrate includes water and at least one kind of pH- adjusting agent selected from a silicon oxide fine particle, an amino acid whose pKa of an amino group is 8 to 10.5, a boric acid, and sodium hydrogen carbonate.
Inventors:
YOSHIDA YUIKO
Application Number:
JP2013090201A
Publication Date:
November 17, 2014
Filing Date:
April 23, 2013
Export Citation:
Assignee:
ASAHI GLASS CO LTD
International Classes:
H01L21/304; B24B37/00; B24B57/02
Attorney, Agent or Firm:
Patent business corporation cherry tree international patent firm
Previous Patent: ELECTRODE BUILT-IN CERAMICS SINTERED COMPACT AND PROCESS OF MANUFACTURING THE SAME
Next Patent: ABRASIVE AND POLISHING METHOD
Next Patent: ABRASIVE AND POLISHING METHOD