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Title:
POLISHING DEVICE ACCOMPANYING ECCENTRIC ROTATIONAL MOTION
Document Type and Number:
Japanese Patent JP2010264536
Kind Code:
A
Abstract:

To provide a polishing device in which a movement accompanying revolution and rotation, and a movement accompanying back-and-forth and swing movements are settable only by replacement of a polishing member.

The polishing device includes a casing (48); a motor (16); a rotary support body (22) drivingly connected to the motor and rotated around a first axis (40); and at least two kinds of polishing members (14, 14-2, 14-3, 14-4) rotatable around a second axis (60) parallel to the first axis (40) and detachably attached to the rotary support body (22). The casing includes a first sliding engagement portion (86), and at least one polishing member (14-2, 14-3, 14-4) includes a second sliding engagement portion (an elongated groove 82, and a pair of protrusions 84) slidably engaged with the first sliding engagement portion. At least one other polishing member (14) is not engaged with the first sliding engagement portion (86) during attachment to the rotary support body.

COPYRIGHT: (C)2011,JPO&INPIT


Inventors:
MURAKAMI KEIICHI
Application Number:
JP2009117274A
Publication Date:
November 25, 2010
Filing Date:
May 14, 2009
Export Citation:
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Assignee:
NITTO KOHKI CO
International Classes:
B24B23/00; B24B45/00
Domestic Patent References:
JPH06320409A1994-11-22
JPH08323608A1996-12-10
JPH045363U1992-01-17
JPH0586459U1993-11-22
JP2000061798A2000-02-29
JPH04115862A1992-04-16
JP2006326781A2006-12-07
JPS4943353Y11974-11-27
Attorney, Agent or Firm:
Shigeru Ito
Hisashi Tsuji