POLISHING DEVICE AND DRESSING METHOD OF POLISHING TOOL

Title:

POLISHING DEVICE AND DRESSING METHOD OF POLISHING TOOL

Document Type and Number:

Japanese Patent JP2004042213

Kind Code:

A

Abstract:

To provide a polishing device for performing polishing of a base board at a stable high polishing speed by performing dressing by the light for preventing an abrasive grain from falling off on a polishing surface, effectively removing influence of a product material generated by this dressing, and stably supplying the abrasive grain autogenous on the polishing surface of a polishing tool.

This polishing tool 13 includes the abrasive grain and a binder for fixing the abrasive grain, and has the polishing tool 13 for polishing a polishing object W by being pressed to the polishing object W, a light source 31 for irradiating to the polishing surface 15 of the polishing tool 13 with a beam of light for weakening fixing force for fixing the abrasive grain of the binder and a foreign matter removing device for forcibly removing foreign matters generated by polishing or those generated by irradiation.

Inventors:

KOJIMA SHIYUNICHIROU
HIROKAWA KAZUTO
KODERA AKIRA

Application Number:

JP2002204498A

Publication Date:

February 12, 2004

Filing Date:

July 12, 2002

Export Citation:

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Assignee:

EBARA CORP

International Classes:

B24B53/00; B24B53/007; B24B53/02; B24D3/34; H01L21/304; (IPC1-7): B24B53/00; B24B53/02; H01L21/304

Attorney, Agent or Firm:

Sadaji Miyakawa
Kiyoshi Miyakawa
Hiroyuki Matsumura
Hirofumi Higashino
Kazuo Takahashi

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