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Title:
POLISHING DEVICE, AND POLISHING METHOD
Document Type and Number:
Japanese Patent JP2012139739
Kind Code:
A
Abstract:

To control a temperature of a polishing pad by spraying a gas to a surface of the polishing pad, suppress deterioration of a polishing rate due to an insufficient polishing liquid feed rate to a polishing interface between a substrate and the polishing pad, and maintain the polishing rate appropriately.

A polishing method includes the steps of controlling the temperature of the polishing pad by spraying the gas to the polishing pad, and polishing the substrate by bringing the substrate into sliding contact with the surface of the polishing pad to which the polishing liquid is fed. A gas flow rate sprayed to the polishing pad at polishing of the substrate and a polishing liquid flow rate fed to the polishing pad are mutually interlocked. For instance, the polishing liquid flow rate fed to the polishing pad at the polishing of the substrate is adjusted based on data showing correlations between the gas flow rate sprayed to the polishing pad at the polishing of the substrate and the required polishing liquid flow rate fed to the polishing pad.


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Inventors:
MATSUO NAONORI
ISHII YU
ONO KATSUTOSHI
Application Number:
JP2010291822A
Publication Date:
July 26, 2012
Filing Date:
December 28, 2010
Export Citation:
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Assignee:
EBARA CORP
International Classes:
B24B37/015; B24B37/00; B24B37/005; B24B49/10; B24B49/12; B24B49/14; B24B49/16; H01L21/304
Domestic Patent References:
JPH10156708A1998-06-16
JPH11188612A1999-07-13
JPH08281551A1996-10-29
JPH11114811A1999-04-27
JP2008103496A2008-05-01
JP2004306173A2004-11-04
JP2008277450A2008-11-13
JP2005342841A2005-12-15
JP2011079076A2011-04-21
JPH09109019A1997-04-28
JP2007181910A2007-07-19
JPH02199832A1990-08-08
JPH10309661A1998-11-24
JPH10156708A1998-06-16
JPH11188612A1999-07-13
JPH08281551A1996-10-29
JPH11114811A1999-04-27
JP2008103496A2008-05-01
JP2004306173A2004-11-04
JP2008277450A2008-11-13
JP2005342841A2005-12-15
JP2011079076A2011-04-21
Attorney, Agent or Firm:
Isamu Watanabe
Ryoji Kosugi
Tetsuya Hirosawa



 
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