To efficiently conduct the changing work of polishing cloth so as to enhance the operation rate of a polishing device, to decrease the working burden of a user, and to improve the workability.

A polishing device is provided with a turn table 100 with the surface carrying polishing cloth 110a pasted on it, a top ring 111, which holds an article to be polished at the position facing the turn table 100, a dressing means 121, which is arranged facing the turn table 100 in order to conduct dressing on the polishing cloth 100a, an evacuating means 131, 141, which evacuate the top ring 111 and/or the dressing means 121 from the position facing the turn table 100, and a communicating means, which communicates the top ring 111 and/or the dressing means 121 with the polishing cloth 100a. When the top ring 111 and/or the dressing means 121 are evacuated, the polishing cloth 100a can be separated from the turn table 100.