Title:
POLISHING FILM AND POLISHING METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2010274348
Kind Code:
A
Abstract:
To provide a polishing film capable of suppressing generation of scratches and performing finish polishing with high smoothness, and also to provide a polishing method using the same.
The polishing film includes a base material film 11 to be the base material of the polishing film 10a and a polishing layer 15a formed on the base material film 11. The polishing layer 15a contains polishing particles 12 and a binder resin 14 for sticking the polishing particles 12. The binder resin 14 is a water-soluble binder resin 14.
Inventors:
TANI KAZUNORI
OSAWA KAZUNARI
SAKAMOTO AKIHIRO
KUMASAKA TAKAYUKI
OSAWA KAZUNARI
SAKAMOTO AKIHIRO
KUMASAKA TAKAYUKI
Application Number:
JP2009127572A
Publication Date:
December 09, 2010
Filing Date:
May 27, 2009
Export Citation:
Assignee:
NIPPON MICRO COATING KK
International Classes:
B24D11/00; B24B19/00; B24D3/00; B24D3/02; B24D3/30; B24D3/34
Attorney, Agent or Firm:
Akira Hori
Hiroki Kojima
Katsumi Inoue
Hiroki Kojima
Katsumi Inoue
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