Title:
POLISHING HEAD AND MANUFACTURING METHOD OF THE SAME
Document Type and Number:
Japanese Patent JP2019058955
Kind Code:
A
Abstract:
To provide a polishing head which enables reduction of differential interference contrast (DIC) at an end stage of a template life.SOLUTION: A polishing head holds a rear surface of a workpiece and places a surface of the workpiece in slidable contact with a polishing cloth applied to a surface plate to polish the surface of the workpiece. The polishing head includes: a head body; and a template which holds the workpiece when the workpiece is polished. The template is adhered to a lower surface peripheral edge part of the head body through an adhesive. An adhesion surface of the head body adhering to the template is roughened.SELECTED DRAWING: Figure 1
Inventors:
DENDA HIROTAKA
KOBAYASHI YOSHIKAZU
KAWAURA YUJI
ENOMOTO TATSUO
KOBAYASHI YOSHIKAZU
KAWAURA YUJI
ENOMOTO TATSUO
Application Number:
JP2017182954A
Publication Date:
April 18, 2019
Filing Date:
September 22, 2017
Export Citation:
Assignee:
SHINETSU HANDOTAI KK
NAGANO ELECTRONICS IND
MIMASU SEMICONDUCTOR IND CO LTD
NAGANO ELECTRONICS IND
MIMASU SEMICONDUCTOR IND CO LTD
International Classes:
B24B37/30; B24B41/06; H01L21/304
Attorney, Agent or Firm:
Mikio Yoshimiya
Toshihiro Kobayashi
Toshihiro Kobayashi