To provide a polishing jig and a polishing device making the abutment of a polishing face of a workpiece and a polishing tool almost uniform, and also, realizing the suppression of the occurrence of sags, shortening of the polishing time, reduction in the damage of the workpiece, and an improvement in the service lifetime of the polishing tool.
The polishing jig 1 has a mounting part 11, a fixed part 12 arranged opposite to the mounting part 11, and a posture adjusting part 14. A hemispherical recessed part 121A is formed on a counter face 112A of the mounting part 11. The posture adjusting part 14, which is integrally formed with the mounting part 11, is a protrusion 141 protruded from the counter face 112A at the base part 112 of the mounting part 11 to the counter face 121 of the fixed part 12.
Fujitsuna Hideyoshi
Osamu Suzawa