Title:
POLISHING MATERIAL
Document Type and Number:
Japanese Patent JP2021030325
Kind Code:
A
Abstract:
To provide a manufacturing method for a polishing material that can eliminate the necessity of a step of making a base material adhere to a support body by laminating a polishing layer directly on a surface side of the support body, is superior in manufacturing efficiency and can prevent deterioration in manufacturing yield due to the adhesion step and peeling of the polishing material when using the material.SOLUTION: A manufacturing method for a polishing material according to the present invention comprises a step of forming a tabular support body and a step of forming a polishing layer including abrasive grain and a binder on a surface side of the support body. The step of forming the support body includes: a step of mixing supercritical fluid with molten resin; a step of injecting the mixed molten resin into a mold having a recessed part that can form the support body; and a step of widening the recessed part of the mold filled with the resin in a plate thickness direction of the support body to be formed.SELECTED DRAWING: Figure 1
Inventors:
YOSHINAGA EISAKU
Application Number:
JP2019150230A
Publication Date:
March 01, 2021
Filing Date:
August 20, 2019
Export Citation:
Assignee:
BANDO CHEMICAL IND
International Classes:
B24D11/00; B24D3/00; B24D3/28
Attorney, Agent or Firm:
Hajime Amano
Fujimoto Katsune
Yoshinori Ikeda
Koji Ishida
Matsuura Masako
Fujimoto Katsune
Yoshinori Ikeda
Koji Ishida
Matsuura Masako