Title:
POLISHING MATERIAL
Document Type and Number:
Japanese Patent JP3521560
Kind Code:
B2
Abstract:
PURPOSE: To obtain a polishing material to be used in finishing operations for the high-level, finished planar accuracy required for magnetic heads or glass fibers, etc., by providing the surface of a substrate with a layer containing a crosslinked polymer particles obtained by polymerizing a crosslinkable monomer having plural groups each containing polymerizable double bond.
CONSTITUTION: This polishing material is obtained by providing the surface of a substrate with crosslinked polymer particles each 0.01-2μm in average diameter obtained by polymerizing ≥5 pts.wt. of a crosslinkable monomer having at least two groups each containing polymerizable double bond. The crosslinkable monomer is e.g. divinylbenzene, polyethylene glycol diacrylate, 1,3-butylene glycol acrylate.
More Like This:
Inventors:
Ishikawa, Satoshi
Masukawa, Toru
Ito, Nobuyuki
Masukawa, Toru
Ito, Nobuyuki
Application Number:
JP18089395A
Publication Date:
April 19, 2004
Filing Date:
June 23, 1995
Export Citation:
Assignee:
JAPAN SYNTHETIC RUBBER CO LTD
International Classes:
C08J5/14; B24D3/00; C08K3/00; C08L25/00; C08L25/02; (IPC1-7): C08J5/14; B24D3/00
Previous Patent: MELODY CONVERTING DEVICE AND ITS METHOD
Next Patent: ENGINE AUTOMATIC STOP/START DEVICE
Next Patent: ENGINE AUTOMATIC STOP/START DEVICE