POLISHING METHOD AND APPARATUS THEREFOR, AND GLASS SUBSTRATE FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM

Japanese Patent JP3619381

B2

PROBLEM TO BE SOLVED: To provide a polishing method capable of efficiently making the inner circumferential end face highly smooth at a low cost by supplying a polishing liquid containing free abrasive grains to the inner circumferential end face of each of disk-shaped glass substrates with a circular hole at the center followed by bringing a polishing brush into rotary contact with the end faces.
SOLUTION: This polishing method comprises the following practice: a number of magnetic disk substrates (MD substrates) 1 each with a circular hole at the center are stacked vertically and held in a substrate case 2, and collars 21 disposed on the top and bottom thereof are clamped with a cover 22; the resulting substrate case 2 is set on a rotary holding table 3, a rotary brush 4 is then threaded onto the inner circumferential part of the circular hole of the MD substrates 1, and the bristles 43 of the brush 4 are situated over a span ranging from the lowermost part 1' to the uppermost part 1" of the MD substrates 1; subsequently, a polishing liquid 50 is fed at a flow of about 500-3,000 mL/min from a relevant feed section 5 toward the circumferential part of the MD substrates 1, the rotary holding table 3 and the rotary brush 4 are then rotated reversely to each other and the polishing liquid 50 is sucked downward by the aid of the rotation of the brush 4.

Takemi Miyamoto

JP37660398A

February 09, 2005

December 23, 1998

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HOYA CORPORATION

B24B9/00; B24B9/08; B24B29/00; C03B23/08; C03B33/02; C03C19/00; G11B5/84; (IPC1-7): C03B33/02; B24B9/00; B24B9/08; B24B29/00; C03C19/00; G11B5/84

JP11048110A

Yasuo Fujimura

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