Title:
POLISHING METHOD AND DEVICE, OPTICAL ELEMENT PROCESSED THEREBY, AND PROJECTING/EXPOSURE DEVICE EQUIPPED WITH OPTICAL ELEMENT
Document Type and Number:
Japanese Patent JP2004098202
Kind Code:
A
Abstract:
To provide a polishing method and device in such a configuration that the air is jetted from a nozzle to a work to be processed held under a polishing liquid, whereby the surface roughness and the stability in processing are enhanced.
The polishing method includes three processes: the polishing liquid 3 is put fully in a vessel 5; the work to be processed 2 is immersed in the polishing liquid 3; and gas 4 is introduced into the polishing liquid 3.
Inventors:
KATO HIDEFUMI
TANIGUCHI EIJI
TANIGUCHI EIJI
Application Number:
JP2002262288A
Publication Date:
April 02, 2004
Filing Date:
September 09, 2002
Export Citation:
Assignee:
NIKON CORP
International Classes:
B24C1/08; B24C3/32; B24C9/00; (IPC1-7): B24C1/08; B24C3/32; B24C9/00
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