Title:
POLISHING METHOD AND POLISHING DEVICE
Document Type and Number:
Japanese Patent JP2016132063
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method and a device for polishing building materials and the like, which enable existing common polishing facilities to be used, and can improve smoothness and glossiness of the building materials without causing noticeable scratches on products.SOLUTION: There is provided a polishing method for polishing a top face of a horizontally conveyed moisture control building material 2 being a material to be polished, in a polishing device 1 included in a decorating apparatus. When sandpaper 11 having endlessly continuing abrasive is circumferentially driven with a lower end portion of the sandpaper 11 abutting the top face of the moisture control building material 2, thus polishing the top face, a direction of travel of the abrasive at the lower end portion of the sandpaper 11 is the same as a direction of conveyance of the moisture control building material 2. Conveyance rollers 13a-d hold the moisture control building material 2 during conveyance so as to be resistant to friction force of the sandpaper 11, and the control is performed so that speed of travel of the abrasive at the lower end portion of the sandpaper 11 is greater than speed of conveyance of the moisture control building material 2.SELECTED DRAWING: Figure 2
Inventors:
SAITO MAMORU
Application Number:
JP2015007790A
Publication Date:
July 25, 2016
Filing Date:
January 19, 2015
Export Citation:
Assignee:
RISO KAGAKU CORP
International Classes:
B24B21/12; B24B41/06
Attorney, Agent or Firm:
Hidekazu Miyoshi
Shunichi Takahashi
Masakazu Ito
Shunichi Takahashi
Masakazu Ito