Title:
POLISHING METHOD AND MANUFACTURING METHOD FOR OPTICAL ELEMENT
Document Type and Number:
Japanese Patent JP2020183010
Kind Code:
A
Abstract:
To provide a polishing method that can be applied to polishing, for example, an affected layer and that makes it possible to polish an optical element of rotationally symmetrical element without deteriorating the shape and roughness of a lens and to provide a manufacturing method for an optical element.SOLUTION: In the polishing method, a polishing tool 10 fixed at one end of a rotary shaft is caused to radially scan a work piece O of rotationally symmetrical shape. The work piece O is polished by bringing the polishing tool 10 into contact with the surface of the work piece O while the polishing tool 10 is rotated in a first direction from a predetermined position on an outer peripheral side of the work piece O to a first position in which an outer peripheral edge of the polishing tool 10 in a forward movement direction is located on this side from the center of the work piece O. The work piece O is further polished by bringing the polishing tool 10 into contact with the surface of the work piece O while the polishing tool 10 is rotated in a second direction opposite the first direction, from the first position to a second position in which the outer peripheral edge of the polishing tool 10 in the forward movement direction is located at the center of the work piece O.SELECTED DRAWING: Figure 1
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Inventors:
ISHIMARU TETSUYA
Application Number:
JP2019088458A
Publication Date:
November 12, 2020
Filing Date:
May 08, 2019
Export Citation:
Assignee:
OLYMPUS CORP
International Classes:
C03B11/00; B24B13/04; C03B25/02; C03C19/00; G02B3/00
Domestic Patent References:
| JP2007136623A | 2007-06-07 | |||
| JP2008307609A | 2008-12-25 | |||
| JP2011041997A | 2011-03-03 | |||
| JP2011036974A | 2011-02-24 | |||
| JP2007144568A | 2007-06-14 |
Attorney, Agent or Firm:
Sakai International Patent Office