Title:
POLISHING METHOD, AND METHOD FOR MANUFACTURING SUBSTRATE
Document Type and Number:
Japanese Patent JP2012176493
Kind Code:
A
Abstract:
To provide a polishing composition and a polishing method for more proper polishing of a nickel phosphorous-plated disc substrate.
The polishing method includes a step of polishing an object to be polished by using, together with a suede type polishing pad, the polishing composition containing: a pad degrading inhibitor selected from a diethylenetriamine penta-acetic acid, a hydroxy ethyl ethylenediamine triacetic acid, a triethylenetetramine hexa-acetic acid and a glutamic acid diacetic acid, and their alkali metal salts and ammonium salts; and an oxidizer.
Inventors:
HIRANO JUNICHI
ISOMURA AKITSUGU
YOKOMICHI NORITAKA
ARAI MASAHIRO
SATO SAYAKA
FUJITA YUTA
ISOMURA AKITSUGU
YOKOMICHI NORITAKA
ARAI MASAHIRO
SATO SAYAKA
FUJITA YUTA
Application Number:
JP2012141031A
Publication Date:
September 13, 2012
Filing Date:
June 22, 2012
Export Citation:
Assignee:
FUJIMI INC
LION CORP
LION CORP
International Classes:
B24B37/00; B24B37/24
Domestic Patent References:
| JP2007088284A | 2007-04-05 | |||
| JP2004277615A | 2004-10-07 | |||
| JP2008235481A | 2008-10-02 |
Attorney, Agent or Firm:
Hironobu Onda
Makoto Onda
Makoto Onda