POLISHING PAD AND ITS MANUFACTURING METHOD

Title:

POLISHING PAD AND ITS MANUFACTURING METHOD

Document Type and Number:

Japanese Patent JP2005074614

Kind Code:

A

Abstract:

To provide a polishing pad which easily forms a groove or the like which requires microprocessing difficult to process by a conventional cutting process, and also to provide its manufacturing method.

In a manufacturing method of a polishing pad 3 which is provided on a surface of a polishing table 1 and polishes the surface of a workpiece 4 slidably arranged over the polishing surface by a chemical mechanical polishing method, the polishing pad 3 whose surface is microprocessed by using a micro-molding method is manufactured.

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Inventors:

BOKU SAIKO
KATO HIROKI
KINOSHITA MASAHARU
TEI KAITO

Application Number:

JP2003311760A

Publication Date:

March 24, 2005

Filing Date:

September 03, 2003

Export Citation:

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Assignee:

NITTA HAAS INC

International Classes:

B24B37/20; B24B37/24; B24B37/26; B29C39/26; H01L21/304; (IPC1-7): B24B37/00; B29C39/26; H01L21/304

Attorney, Agent or Firm:

Kazuhide Okada

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