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Patent Searching and Data


Title:
POLISHING PAD AND METHOD FOR MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2016196057
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a polishing pad excellent in dressing properties and suppression of occurrence of a polishing scratch, and to provide a method for manufacturing the same.SOLUTION: There is provided a polishing pad having a polyurethane resin sheet, in which, when having measured the polyurethane resin sheet at measurement frequency of 10 radian/second and a tension mode, a ratio (tanδ(25°C)) of loss elastic modulus E" (25°C) to storage elastic modulus E'(25°C) at 25°C of the polyurethane resin sheet is 0.25 or less, and storage elastic modulus E' at 45 to 65°C of the polyurethane resin sheet is 200 MPa or less.SELECTED DRAWING: None

Inventors:
MIYASAKA HIROHITO
TATENO TEPPEI
MATSUOKA RYUMA
KIRAKU YOSHIE
Application Number:
JP2015076726A
Publication Date:
November 24, 2016
Filing Date:
April 03, 2015
Export Citation:
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Assignee:
FUJIBO HOLDINGS INC
International Classes:
B24B37/24; C08G18/10; C08G18/32; C08J9/32; H01L21/304
Domestic Patent References:
JP2012528487A2012-11-12
JP2015062260A2015-04-02
JP2013089767A2013-05-13
JP2014065119A2014-04-17
JP2010274361A2010-12-09
JP2000344902A2000-12-12
JP2012115982A2012-06-21
JP2004507076A2004-03-04
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Atsushi Hakoda
Kenji Asai
Kazuo Yamazaki
Satsuki Ichikawa
Yasushi Sasaki