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Title:
POLISHING PAD OF SUBSTRATE FOR MAGNETIC RECORDING MEDIUM AND POLISHING METHOD
Document Type and Number:
Japanese Patent JPH10249737
Kind Code:
A
Abstract:

To provide the surface roughness of a specific range, by impregnating a fiber base material of nonwoven fabric with a polyurethane resin, and solidifying the same in wet to obtain the hardness of a specific range.

A substrate 1 is placed between a polishing pad 3 fixed to an upper surface plate made of cast iron, and a polishing pad 4 fixed to a lower surface plate with the proper pressure in a double face polishing machine, and the polishing fluid containing a polishing agent 5 is supplied between the polishing pads 3, 4 and the substrate 1, to perform the polishing by rotating and sliding the polishing pads 3, 4. On this occasion, the polishing pads 3, 4 which are prepared by impregnating the fiber base material of nonwoven fabric with a polyurethane resin, and solidifying the same in wet, and has 75-85 of hardness by a hardness test (A-type) stipulated by JIS K6301, are pasted to the upper and lower surface plates. Whereby the surface roughness of the substrate for a magnetic recording medium can be finished within a specific range constantly.


Inventors:
YOSHINO KUNIHIKO
KONDO MASAO
KUSANO TATSUICHI
Application Number:
JP6129497A
Publication Date:
September 22, 1998
Filing Date:
March 14, 1997
Export Citation:
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Assignee:
NIKON CORP
SAGAMI OPT KK
International Classes:
B24B1/00; B24B37/20; B24B37/24; B24B37/26; B24D11/00; G11B5/84; (IPC1-7): B24D11/00; B24B1/00; B24B37/00; G11B5/84



 
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