Title:
POLISHING TOOL AND POLISHING METHOD
Document Type and Number:
Japanese Patent JP2000033549
Kind Code:
A
Abstract:
To obtain a smooth polished surface without a tool mark and a scratch even when a material such as polyethylene having ultrahigh molecules is polished and machined.
In a polishing tool used to polish and machine an object 5 to be polished by rotating the polishing tool 8 and the object 5 to be polished respectively in a condition in which a polishing pressure is generated between the polishing tool 8 and the object 5 to be polished and oscillating the polishing tool 8 and the object 5 to be polished relatively, an artificial or natural chamois leather is used in a polishing pad part 4 for polishing a surface to be polished of the object 5 to be polished.
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Inventors:
KUSANAGI KAZUMI
Application Number:
JP20162198A
Publication Date:
February 02, 2000
Filing Date:
July 16, 1998
Export Citation:
Assignee:
NIKON CORP
International Classes:
B24B29/00; (IPC1-7): B24B29/00