Title:
ポリシロキサンブロックコポリマー類
Document Type and Number:
Japanese Patent JP5547492
Kind Code:
B2
Abstract:
This invention encompasses novel amphiphilic block copolymers comprising polysiloxane blocks and polycationic blocks. The polycationic blocks are formed from diallyldialkylammonium derivatives. The formed block copolymers are particularly useful for treating or conditioning keratinous substances such as hair or skin.
Inventors:
コロスケニ, Balint
Gaye Mus * Garcia, Manuel
Mao, Gen Wen
Gaye Mus * Garcia, Manuel
Mao, Gen Wen
Application Number:
JP2009547658A
Publication Date:
July 16, 2014
Filing Date:
January 29, 2008
Export Citation:
Assignee:
チバ Holding Incorporated Ciba Holding Inc.
International Classes:
C08F293/00; A61K8/46; A61K8/898; A61Q5/02; A61Q5/12; C08G77/392
Attorney, Agent or Firm:
Sepal Tsuneo
Yoshio Miyazaki
Tsutomu Kato
Kyoko Koyama
伴 Tomoatsu
Yoshio Miyazaki
Tsutomu Kato
Kyoko Koyama
伴 Tomoatsu