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Patent Searching and Data


Title:
POLYACETAL RESIN COMPOSITION AND PREPARATION
Document Type and Number:
Japanese Patent JP2000044769
Kind Code:
A
Abstract:

To improve thermal stability and molding stability of a polyacetal resin thereby inhibiting the evolution of formaldehyde.

Into 100 pts.wt. of powdery and granular materials of a polyacetal resin are incorporated around 0.001-10 pts.wt. of an inhibitor composed of an active hydrogen-containing compound. The active hydrogen- containing compound is at least one selected from the group consisting of ureas (N-substituted ureas, urea condensates and the like) and amidines [N-substituted derivatives of amidines, guanidines (cyclic guanidines and non-cyclic guanidines) and the like]. As the polyacetal resin can be employed a weathering resistant or light resistant polyacetal resin and a colorant may be added to the polyacetal resin.


Inventors:
HARASHINA HATSUHIKO
KURITA HAYATO
Application Number:
JP13870799A
Publication Date:
February 15, 2000
Filing Date:
May 19, 1999
Export Citation:
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Assignee:
POLYPLASTICS CO
International Classes:
C08L59/00; C08K3/00; C08K5/21; C08K5/29; C08L61/24; (IPC1-7): C08L59/00; C08K3/00; C08K5/21; C08K5/29; C08L61/24
Attorney, Agent or Firm:
Mitsuo Hokita