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Title:
ポリアセタール樹脂組成物
Document Type and Number:
Japanese Patent JP5085061
Kind Code:
B2
Abstract:
The present invention provides a polyacetal resin composition having an excellent processability and stability, significantly suppressing the generation of formaldehyde from molded articles thereof, preventing exudation of components, and being excellent in weathering (light) resistance. Specifically, (A) a polyacetal copolymer having 1.0 mmol/kg or smaller quantity of a hemiformal terminal group, 2.0 mmol/kg or smaller quantity of a formyl terminal group, and 0.5% by weight or smaller quantity of an unstable terminal group is blended with (B) a hindered phenol-based antioxidant; (C) at least one compound selected from (c-1) a guanamine compound and (c-2) a hydrazide compound; (D) a hindered amine stabilizer in which the nitrogen in a piperidine derivative having a steric hindrance group is tertiary; and (E) a UV absorber in specified quantities and mixing ratios.

Inventors:
Hiroyuki Hase
Application Number:
JP2006180951A
Publication Date:
November 28, 2012
Filing Date:
June 30, 2006
Export Citation:
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Assignee:
Polyplastics Co., Ltd.
International Classes:
C08K5/13; C08L59/00; C08K5/20; C08K5/24; C08K5/3432; C08K5/3475; C08K5/3477
Domestic Patent References:
JP7309994A
JP2006045489A
JP2001354832A
JP2006232937A
Foreign References:
WO2005044917A1
Attorney, Agent or Firm:
Satoshi Furuya
Takahiko Mizobe
Shinji Mochida
Yoshitsune Kazumasa



 
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