Title:
ポリアリーレンスルファンケトン樹脂、及びその成形体
Document Type and Number:
Japanese Patent JP7403120
Kind Code:
B2
Abstract:
To provide a polyarylene sulfane ketone resin (PASK resin) that can be produced in high yield by a practical and simple method, and exhibits a low crystalline melting point with excellent moldability while having a high glass transition temperature with excellent heat resistance.SOLUTION: A polyarylene sulfane ketone resin has a repeating unit represented by the general formula (1-1) in the figure. (In the formula (1-1), X1, X2 and Y are each an oxygen atom or sulfur atom, provided that any one or more of X1, X2 and Y are sulfur atoms.)SELECTED DRAWING: None
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Inventors:
Naoto Yagi
Iwate Exhibition
Toshikazu Takada
Satoshi Ogawa
Hiroki Muraoka
Iwate Exhibition
Toshikazu Takada
Satoshi Ogawa
Hiroki Muraoka
Application Number:
JP2019206970A
Publication Date:
December 22, 2023
Filing Date:
November 15, 2019
Export Citation:
Assignee:
DIC Corporation
Iwate University
Iwate University
International Classes:
C08G67/00; C08J5/18; C08L73/00
Domestic Patent References:
| JP58208320A | ||||
| JP2002332346A |
Other References:
Mitsuru UEDA et al.,“Synthesis of aromatic poly(thioether ketone)”,Journal of Polymer Science Part A: Polymer Chemistry,1992年08月,Vol. 30, No. 9,p.1993-1998,DOI: 10.1002/pola.1992.080300923
Attorney, Agent or Firm:
Ryoichi Takaoka
Nao Oda
Takako Takagi
Sachiko Komori
Yoshihiro Higuchi
Nao Oda
Takako Takagi
Sachiko Komori
Yoshihiro Higuchi