Title:
POLYBENZAZOLE FILM AND ITS MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2004106407
Kind Code:
A
Abstract:
To produce a heat resistant polymer film excellent in the balance of longitudinal/transverse strengths and high in a peeling strength.
The polybenzazole film, which is excellently balanced in longitudinal/transverse strengths and of high grade, is manufactured by extruding from a non-rotating die a solution of a rigid-rod polymer as high in concentration as 1-1.3 times as against the solution concentration of its optical anisotropy lower limit C2, subsequently biaxially orienting the rigid-rod polymer solution in the form of a film and then solidifying in a solidifying solution, removing the solvent with a washing fluid, and then removing the washing fluid.
Inventors:
MURASE HIROTAKA
TERAMOTO YOSHIHIKO
WATANUKI SEIJI
TERAMOTO YOSHIHIKO
WATANUKI SEIJI
Application Number:
JP2002273725A
Publication Date:
April 08, 2004
Filing Date:
September 19, 2002
Export Citation:
Assignee:
TOYO BOSEKI
International Classes:
C08J5/18; B29C48/08; B29C48/305; B29C55/00; B29C55/12; B29D7/01; (IPC1-7): B29C55/12; C08J5/18